Why is EUV lithography better than conventional photolithography at making smaller microchips?

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Why is EUV lithography better than conventional photolithography at making smaller microchips?

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The wavelength of EUV is about 13.5 nm making it easier to pattern circuits in the microchips with geometries 10nm and smaller. Previous to EUV, 193nm “deep ultraviolet” was the state of the art. While EUV is used to pattern the smaller features of a chip, 193nm is still used to pattern some of the layers as EUV is slower, and is very inefficient.

https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithography?wprov=sfti1